Plasma reactor for etching printed circuit boards or the like

摘要

This plasma reactor for etching printed circuit boards or the like has a reaction chamber (1), a gas inlet and gas outlet (8, 9) and electrodes (11) between which the printed circuit boards to be treated can be arranged. In order to enable uniform treatment of even large-area workpieces with very high efficiency, it is provided that a frit (diffuser plate) (6) (which extends essentially over the entire length and width of the reaction chamber) be provided, preferably on the top of said reaction chamber (1), for the gas supply and be covered on the outside by a gas-tight cover (7) (Figure 1). <IMAGE>