Vacuum deposition system and method.

摘要

The system for forming a uniform layer of a material from a vapor phase onto the surface of an object at a high rate of deposition includes
a reservoir (10) for heating a material from which gas is propagated;
a low pressure reactor (20) wherein said layer is formed;
connecting means (18) between said reservoir and said reactor;
means connected to the outlet of said reactor for creating a vacuum therein and causing said gas to flow from said reservoir through said connecting means to said reactor;
first pressure control means at the outlet of said reservoir for maintaining the pressure of said gas at the reservoir end of said connecting means at a first value; and
second pressure control means at the inlet of said reactor for maintaining the pressure of said gas thereat at a second value by adjusting said means for creating a vacuum, thereby providing a constant mass flow rate of said gas into said reactor.
<??>The method of forming a layer of material from a gas upon the surface of an object comprises:
heating a reservoir to a temperature sufficient to vaporize a material from which said gas is formed;
creating a vacuum in a reactor containing said object to cause said gas to flow from said reservoir through a connecting means to said reactor; and
maintaining the reservoir outlet pressure and the reactor inlet pressure at constant values, thereby providing a constant mass flow rate of said gas into said reactor.