Method of forming highly sensitive photoresist film in the absence of water

摘要

Method of forming highly sensitive, high resolution positive photoresist compositions that are developed from polycarbonates derived from t-diols and various diphenols and homopolycarbonates from t-diols, mixed with 2-10% of onium salts wtih complex metal halide counterions. The high sensitivity of the photoresist compositions is due to the thermodynamic stabilities of the resulting incipient dicarbocations and dienes.