| 摘要 |
A refractory metal silicide coating is electrodeposited onto an object, using a bath containing an alkali fluoride melt, a silicon fluoride dissolved in the melt, a refractory metal-containing compound also dissolved in the melt. An anode composed of the refractory metal is immersed in the bath. The article to be coated is immersed in the bath as the cathode, a platinum electrode is immersed in the bath, and a voltage is applied between the cathode and platinum electrode until the coating obtains the desired thickness. By this process, coatings such as tantalum silicide and titanium silicide having a desired stoichiometric composition may be deposited on the surface of an object.
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