| 摘要 |
PURPOSE:To improve the pattern accuracy by forming a protection resist after a background layer is removed so as to prevent a magnetic pole forming part from being corroded due to chemical etching. CONSTITUTION:A background layer 10 being an electric active layer, a photo resist frame 11 to form a frame pattern and an electric inactive magnetic layer 12 having a magnetic anisotropy in a desired direction by the plating method in a magnetic field are formed on a base 11. Then the frame 11 and the layer 10 beneath the frame 11 are removed by the etching and the part after the removal and a magnetic pole 14 of the frame pattern layer 12 are covered by the protection regist 13 with a high anti-chemical etching. In removing the layer 12 by the etching in this state, the layer 10 having a pattern not corroded by the chemical etching and the magnetic pole 14 are formed without any etching management to improve the pattern accuracy easily. |
