发明名称 BESCHICHTUNG FUER EIN SUBSTRAT UND VERFAHREN ZU DESSEN HERSTELLUNG
摘要 <p>To obtain a pore-free and firmly adhering coating, which is durable even at high temperatures, for a substrate, especially of a refractory metal, it is proposed that the coating consists of aluminium silicate. A process for producing such a coating is also proposed. According to this process, the coating material is introduced in powder form into a plasma jet generated by means of a plasma burner and then deposited on the substrate. While this is being done, the plasma burner and the substrate are held in a reduced-pressure environment. <IMAGE></p>
申请公布号 DE3538390(A1) 申请公布日期 1987.04.30
申请号 DE19853538390 申请日期 1985.10.29
申请人 DEUTSCHE FORSCHUNGS- UND VERSCUCHSANSTALT FUER LUFT- UND RAUMFAHRT EV 发明人 HENNE,RUDOLF,DIPL.-PHYS.DR.;WEBER,WINFRIED,DIPL.-PHYS.;V.,DIPL.-PHYS.DR. BRADTKE,MICHAEL
分类号 C23C4/02;C23C4/10;C23C4/12;F24J2/48;(IPC1-7):C23C4/10 主分类号 C23C4/02
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