发明名称 |
BESCHICHTUNG FUER EIN SUBSTRAT UND VERFAHREN ZU DESSEN HERSTELLUNG |
摘要 |
<p>To obtain a pore-free and firmly adhering coating, which is durable even at high temperatures, for a substrate, especially of a refractory metal, it is proposed that the coating consists of aluminium silicate. A process for producing such a coating is also proposed. According to this process, the coating material is introduced in powder form into a plasma jet generated by means of a plasma burner and then deposited on the substrate. While this is being done, the plasma burner and the substrate are held in a reduced-pressure environment. <IMAGE></p> |
申请公布号 |
DE3538390(A1) |
申请公布日期 |
1987.04.30 |
申请号 |
DE19853538390 |
申请日期 |
1985.10.29 |
申请人 |
DEUTSCHE FORSCHUNGS- UND VERSCUCHSANSTALT FUER LUFT- UND RAUMFAHRT EV |
发明人 |
HENNE,RUDOLF,DIPL.-PHYS.DR.;WEBER,WINFRIED,DIPL.-PHYS.;V.,DIPL.-PHYS.DR. BRADTKE,MICHAEL |
分类号 |
C23C4/02;C23C4/10;C23C4/12;F24J2/48;(IPC1-7):C23C4/10 |
主分类号 |
C23C4/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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