| 摘要 |
PURPOSE:To attain always specified and high sensitivity regardless of the time till development after exposure by subjecting a photosensitive plate to a warm water treatment after exposure. CONSTITUTION:The photosensitive plate provided with the photosensitive layer consisting of 0.01-10wt% compd. which can generate an acid when irradiated with active rays, 10-40wt% compd. which is a compd. having an acid decomposing bond group and has the solubility in a developing soln. of the resulted product higher than the solubility of the compd. when decomposed by an acid and 60-90wt% alkali soluble resin on a substrate is treated for >=10sec with >=25 deg.C warm after image exposure and thereafter the non-image part is removed by an aq. alkaline soln. The warm water treatment is preferably executed as quickly as possible after exposure, for example, within about one hour after exposure. The temp. of the warm water is preferably 30-50 deg.C and >=60 deg.C is undesirable. The warm water treatment time is preferably 30-120sec. |
