| 摘要 |
<p>PURPOSE:To hold a photomask without deflection and to uniformly form patterns with an exposing device for forming the patterns by using the photomask onto a large-sized substrate by providing a transparent photomask holder which attracts and holds the photomask. CONSTITUTION:The photomask holder 9 is made of a UV transmissive material, for example, quartz and grooves 13 for correction and attraction are provided to a holding surface 12 in contact with a surface 11 on the side opposite from the pattern surface 4 of the photomask 3. The grooves 13 are uniformly arranged on the holding surface 12 to uniformly attract the surface 11 of the photomask 3 in tight contact therewith. Since the entire surface of the photomask is attracted and held, the large-sized photomask is supported without warpage and the patterns are uniformly formed.</p> |
