发明名称 VERFAHREN ZUM DOTIEREN VON HALBLEITERMATERIAL
摘要 1,274,362. Semi-conductors. MATSUSHITA ELECTRONICS CORP. 16 March, 1970 [20 March, 1969], No. 12580/70. Heading H1K. Impurity elements are diffused into a semiconductor, e.g. silicon substrate, to give N- or P-type conductivities, by dissolving an impurity compound, e.g. phosphorous pentoxide, phosphoric acid, arsenic trioxide, arsenic trichloride, antimony trichloride, diboron trioxide, aluminium chloride, gallium chloride, indium chloride; into a volatile solvent, e.g. water ethanol, ethyl cellosolve, methanol, ethyl ether, amylacetate, acetone, dioxane, acetic acid esters, dioxane; together with an organic coating material, e.g. pyroxylin, acetyl cellulose, polyvinyl acetate, polyvinyl alcohol; the mixture being coated on the substrate and the solvent evaporated; after which the impurity is diffused into the substrate by heating. Autoradiography of the substrate after diffusion of labelled phosphorus impurity shows the distribution thereof.
申请公布号 DE2012927(B2) 申请公布日期 1972.04.20
申请号 DE19702012927 申请日期 1970.03.18
申请人 发明人
分类号 C23C8/06;C30B31/02;H01L21/00;H01L21/225;H01L23/29;(IPC1-7):01J17/34 主分类号 C23C8/06
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