| 摘要 |
<p>This invention is directed to a mask ring assembly for X-ray lithography which is particularly adapted, among other possible uses, for use in replicating integrated circuit patterns, said assembly including a mask ring, a plurality of kinematic mounts for removably mounting the mask ring on an alignment cartridge, each of the kinematic mounts including a funnel-like shaped seat member and a mating ball-like shaped member, one of said members being on the mask ring and the other of the members being mounted on the alignment cartridge.</p> |
