发明名称 PROTECTION OF IGFET INTEGRATED CIRCUITS FROM ELECTROSTATIC DISCHARGE
摘要 <p>Integrated circuits implemented in insulated gate (e.g., CMOS) technology have been protected from electrostatic discharge (ESD) by a metal gate field effect transistor. It has been recognized that a &quot;parasitic&quot; bipolar transistor exists in parallel with the metal gate device. Surprisingly, superior protection is obtained by omitting the metal gate, thereby relying only on the avalanche breakdown of the bipolar device for the opposite-polarity protection. It is postulated that the field effect of the metal gate device undesirably restricted the current flow in the prior art technique. The inventive technique may be advantageously implemented using a diode rather than a transistor as the protective element.</p>
申请公布号 WO1987002511(A1) 申请公布日期 1987.04.23
申请号 US1986001974 申请日期 1986.09.22
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