| 摘要 |
PURPOSE:To prevent alignment deviation by confirming an alignment at three or more positions when a mask of a semiconductor substrate whose pattern has been formed is aligned. CONSTITUTION:Three microscopes 5 which confirm the alignment of a mask 2 and a semiconductor substrate 1 separately in pattern regions which are formed at mutually different positions in the same horizontal plane above the mask 2 held by a mask holder 3 are provided in parallel as optical sensors. Then, the alignment conditions are separately confirmed respectively with the three pattern regions which are formed at different positions by the microscopes 5. This prevents alignment deviation. |
