| 摘要 |
<p>PURPOSE:To omit a thin-film working process and to simplify photomask manufacture by coating the surface of a transparent substrate which has a chloride emulsion film with a transparent film which is harder than the chloride emulsion film. CONSTITUTION:When development is carried out after exposure by a photoplotter, chloride emulsion 1 on the glass substrate 2 is patterned, and silicon oxide forming a protection film 3 is sputtered to 2000Angstrom thickness. Then, the protection film 3 is not dissolved at all even by being swept with acetone which is used for cleaning the ultraviolet-ray cut-off film surface of a photomask, thereby maintaining sufficient durability.</p> |
