| 摘要 |
PURPOSE:To make it possible to uniformly and accurately polish the rotating surface of a rotating body, by providing a polishing tape which runs forward at a speed different from the peripheral speed of the rotating body, and a support member adapted to make into press-contact with the rotating surface of the rotating body so that a uniform pressure may be applied by the support member. CONSTITUTION:A bed 4 on a cylindrical support member 3 is laid in parallel with the generatrix of an exposure drum 1, and a polishing tape 2 is loaded by a weight 5. A motor 6 feeds the polishing paper 2 at a constant speed while the tape 2 is pulled by a weight 7. At this time, the polishing tape 2 is fed in the forward direction of rotation of the exposure drum 1, and therefore, polishing may be made with no SiC abrasive power or foreign object being accumulated in the gap between the tape 2 and the drum 1. Thus, rubbing for polishing is effected due to the provision of a difference in speed between the speed of the polishing tape 2 and the peripheral speed of the exposure drum 1. Further, it is possible to apply a uniform pressure to the tape 2 by means of the cylindrical support member 3, thereby it is possible to uniformly and precisely polish the drum. |
