FORMATION OF PROTECTIVE COATING ON FILM PHOTOMASK

摘要

PURPOSE:To easily form a protective coating film on a photomask by cleaning the photomask and bringing it into contact with the vapor of alkylfluoroalkoxysilane. CONSTITUTION:The photomask is cleaned and held in the vapor of alkylfluoroalkoxysilane to arrange fluoroalkyl groups on the surface of the photomask. The alkylfluoroalkoxysilane is obtd. by substituting a fluoroalkyl group for at least one alkyl group represented by a formula ClH2l+1 in alkylalkoxysilane represented by formula I.