| 摘要 |
PURPOSE:To prevent the fall of unnecessary resulted product of reaction and to improve film quality by providing a semi-cylindrical electrode which is opened in the upper part to face a cylindrical substrate so as to cover the substrate. CONSTITUTION:The semi-cylindrical electrode 3 which is opened in the upper part for making glow discharge is provided to face the cylindrical substrate 1 to be formed with an amorphous silicon film, etc. Many small holes to supply a reactive gas are provided to the electrode 3. The reactive gas is supplied from these holes to the circumference of the substrate 1. A high-frequency voltage is impressed to the electrode 3 to generate the glow discharge between the substrate 1 and the electrode 3. The reactive gas is held activated and the particles of the reactive gas deposit on the substrate 1 to form the amorphous silicon film, etc. Since the substrate 1 is under rotation, the film formation is uniformly executed. A reaction vessel wall 5 above the substrate 1 is fairly apart from the electrode 3 and the glow discharge is not generated above the substrate 1; therefore, the fall of the unnecessary resulted product of reaction from above is obviated. |
