发明名称 |
LITHOGRAPHISCHER MASKENAUFBAU UND LITHOGRAPHISCHES VERFAHREN |
摘要 |
There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise. |
申请公布号 |
DE3634147(A1) |
申请公布日期 |
1987.04.16 |
申请号 |
DE19863634147 |
申请日期 |
1986.10.07 |
申请人 |
CANON K.K. |
发明人 |
KATO,HIDEO;IZAWA,YOSHIE;CHIBA,KEIKO |
分类号 |
G03F1/14;G03F1/22;G03F7/20;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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