| 摘要 |
PURPOSE:To prevent the generation of the discharge phenomenon of an static electricity which has especially tendency for generating in the large sized photomask and to improve an transparency of the titled photomask and an adhesive property between said photomask and its adjacent layer by providing an electroconductive film made of a tantalum oxide having a specific transmissivity and a thickness of the thin film on a transparent substrate and then by providing a thin film having a light shaft property on the prescribed film. CONSTITUTION:The titled photomask is composed of the electroconductive thin film 2 which is made of the tantalium oxide (TaOx:X<=2) and has 30-80Angstrom a thickness and has >=75% transmissivity against a light having a photosensitive range of a photosensitive resin provided on the transparent substrate, and the thin film 3 having a light shade property against the prescribed light provided on said film 2. When the X is 25, said tantalium oxide means the tantalium penta oxide (Ta2O5) which is a complete insulator and does not display an electrically conductivity. When said film is thinner than that of 30Angstrom , its conductivity is a rather insufficient. While when said film is thickener than that of 80Angstrom , as the film does not display >=75% the transmissivity against the prescribed light, it is not preferable. The optimum value of the thickness of the film is 40-60Angstrom . Thus, the surface resistance value of said film is 10-20kOMEGA/cm<2> and is preferable. |
