| 摘要 |
PURPOSE:To measure the microscopic objective pattern arranged in close vicinity of other patterns in a highly precise manner and to accurately recognize the pattern by a method wherein the edge signal only of the objective pattern is extracted by comparing the edge-to-edge measurement of the pattern with the edge-to-edge measurement of the reference pattern set in advance. CONSTITUTION:The main body 1 of a device is positioned at the position as shown by the chained line A-A in the diagram opposing to CCD6x in X-direction and the output of its reflected light is outputted to a processing circuit 9. As a result, the edge signal Se of each pattern can be obtained on the processing circuit 9, and said signal is outputted to a comparison circuit 12. On the comparison circuit 12, the edge signal Se is compared with the positional signal Sp sent from an X-Y driving part 4, an arithmetic operation is conducted by an arithmetic unit 13, the measurements of peak positions l1-l9 of the edge signal Se are measured, and the peak-to-peak measurement is worked out. Said peak-to-peak measurement is compared with the reference pattern measurement inputted from the reference data part 11 using the comparison circuit 12. The edge signal of the first process pattern and the second process pattern are extracted from a number of edge signals Se above-mentioned by comparing the reference pattern measurement with said peak-to-peak measurement and by matching the two measurements. |
