| 摘要 |
<p>PURPOSE:To produce a satisfactory liquid crystal display with the mask aligning accuracy of several hundred microns by forming the element in such a manner that the lower metal of wiring can be disposed under transparent picture element electrodes. CONSTITUTION:Ta is sputtered on a glass substrate 1 and polyimide is coated thereon. The two layers are simulaneously patterned by using a dry etching method to form a lower metal 2 and insulating film 3 on the substrate 1. The substrate 1 is subjected to anodic oxidation to form an oxide insulating film 4 on the side face of the metal 2. Cr is further formed thereon and is patterned to form an upper metal 5. An insulator 6 such as photosensitive polyimide is coated on the surface and is exposed from the rear side. A transparent electrode consisting of ITO, etc., is formed on the substrate to cover the metal 5 and is patterned to form the transparent picture element electrodes 7.</p> |
