发明名称 LASER BEAM VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To prevent the contamination of a window for laser light built on the inside of a vacuum vessel and to permit the vapor deposition on the side face of a substrate for vapor deposition as well by providing a box for differential evacuation which has a microhole and into which an inert gas is introduced to the inside of the vacuum vessel of a laser beam vapor deposition device and making the laser light for heating a vapor source incident from the microhole. CONSTITUTION:The inside of the vacuum vessel 6 contg. the vapor source 8 and the substrate 12 for vapor deposition is evacuated by an evacuation device essentially consisting of a hydraulic rotary pump 22 to a vacuum. The box 14 for differential evacuation enclosing the incident window 4 for the laser light 2 is provided in the vacuum vessel 6 and after the inside thereof is evacuated by an evacuation means 18, gaseous Ar is introduced therein from a valve 24. A high-pressure Ar atmosphere is maintained therein from the vacuum vessel 6. The incident laser light 2 from the window 4 of the vacuum vessel 6 passes through the microhole 16 provided to the box 14 and heats the vapor source 8, thus forming a thin film 12 on the substrate 12 by evaporating particles 10. The pressure in the box 14 is higher than the pressure in the vacuum vessel 6 and since the laser light is made incident through the microhole 16, the particles 10 do not enter the box 14 and therefore, the window 4 is not contaminated. The particles 10 are scattered by the gaseous Ar entering the inside of the vessel 6 through the microhole 16, by which the vapor-deposited film is formed on the side face of the substrate 12.
申请公布号 JPS6277456(A) 申请公布日期 1987.04.09
申请号 JP19850218464 申请日期 1985.09.30
申请人 SHIMADZU CORP 发明人 OKADA SHIGENOBU
分类号 C23C14/24;C23C14/28 主分类号 C23C14/24
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