发明名称 APPARATUS AND PROCESS FOR ARC VAPOR DEPOSITING A COATING IN AN EVACUATED CHAMBER
摘要 <p>A process and apparatus for coating a substrate (14) with source material from a solid cathode (15) in a vacuum chamber (11) supplied with a reactive or inert gas (39) at low pressure. An electric arc (34) is generated between an evaporable end surface (35) of the cathode (15) and an anode (18). An elongated member (36) surrounds the cathode (15) and extends a predetermined minimum distance &quot;X&quot; beyond the evaporable end surface (35) of the cathode (15) to form a cathode chamber (37). The inert or reactive gas (39) is directed to flow into the cathode chamber (37) before entering the vacuum chamber (11).</p>
申请公布号 WO1987002072(A1) 申请公布日期 1987.04.09
申请号 US1986002030 申请日期 1986.09.30
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