FORMATION OF THIN FILM BY PLASMA CVD METHOD,申请号JP19850218755-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	FORMATION OF THIN FILM BY PLASMA CVD METHOD
摘要
申请公布号	JPS6277479(A)	申请公布日期	1987.04.09
申请号	JP19850218755	申请日期	1985.09.30
申请人	SHIMADZU CORP	发明人	KASHIMA YOSHIO
分类号	C23C16/50	主分类号	C23C16/50
代理机构		代理人
主权项
地址

您可能感兴趣的专利

APPARATUS FOR CLEANING A SUBSTREAT

HOW TO PRODUCE, USENAK-WHA POLEWHICH IS USED TO MAKE A VISUAL EFFECT OF FALLING FIRE BY SAWLEAF ZELKOVA SHELL CHARCOAL

DISPLAY STAND OF ACCESSORIES

An electrochemical apparatus

FRAME ASSEMBLY OF MOBILE RACK

Treatment of Textile Materials

CALCIUM CHANNEL ANTAGONISTS

Glycosylation of aminocoumarins

FOLDABLE CONTAINER WITH GUSSET FOLDS

Reinforcement ring

Garment hanger and indicia tag

A QUINOLINE DERIVATIVE ACTING AS A P2X7-RECEPTOR ANTAGONIST

PROLYL HYDROXYLASE INHIBITORS

COMPOSITION FOR NUCLEIC-ACID INTRODUCTION

LUBRICANT COMPOSITION FOR OIL RETAINING BEARING

OPTICAL SCAN DEVICE, OPTICAL SCAN TYPE MICROSCOPE, OBSERVATION METHOD, CONTROL DEVICE, AND CONTROL PROGRAM

MBE GROWN ALKALI ANTIMONIDE PHOTOCATHODES

SURGICAL INSTRUMENT