发明名称 Semiconductor device with a high breakdown voltage.
摘要 <p>There is disclosed a power transistor comprising a semiconductor substrate (1) having a PN junction exposed on a major surface of the semiconductor substrate, and a semiinsulative polysilicon film (16) formed on the major surface, the polysilicon film covering the PN junction, the polysilicon film containing at least one of carbon, oxygen, and nitrogen, and the polysilicon film having a thickness of about 3,000 Å. </p>
申请公布号 EP0217326(A2) 申请公布日期 1987.04.08
申请号 EP19860113342 申请日期 1986.09.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 BABA, YOSHIRO PAT. DIVISION;TSURU, KAZUO PAT. DIVISION;AKIYAMA, TATSUO PAT. DIVISION;KOSHINO, YUTAKA PAT. DIVISION
分类号 H01L29/40;H01L29/73;H01L21/331;H01L29/04;H01L29/06;H01L29/732 主分类号 H01L29/40
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