Process for a thermal treatment of a polysilazane containing 3BOND SiH groups and 3BOND Si-NH- groups

摘要

A process for the thermal treatment of a polysilazane at a temperature from about 40 DEG C. to 220 DEG C. The polysilazane contains on average at least two, preferably at least three, 3BOND SiH groups per molecule and at least two <IMAGE> groups and, if appropriate, unsaturated aliphatic hydrocarbon groups bonded to the silicon atoms. The polysilazanes treated in this manner have good thermal behavior and can be used in particular as precursors of ceramic products with a high yield of inorganic products.