发明名称 PHOTOPOLYMERIZABLE COMPOSITION
摘要 PURPOSE:To obtain the title composition highly sensitive to visible light, by mixing an addition-polymerizable compound having an ethylenically unsaturated group with a specified photopolymerization initiator system. CONSTITUTION:A (thio or seleno)pyrylium salt (A) of the formula (wherein R1-3 are each H, alkyl, alkoxy, amino, hydroxyl, nitro or a halogen, X is O, S or Se and Y is an anionic functional group) is combined with a heterocyclic compound (B) having a thiol group bonded to a heterocyclic ring comprising 5-7 atoms including at least one N atom (e.g., 2-mercaptoimidazole) at a weight ratio of component A to component B of 100:1-1:100 to obtain a photopolymerization initiator system (C). To 100pts.wt. addition-polymerizable compound having at least one terminal ethylenically unsaturated group (e.g., acrylic acid), component C is added in an amount to provide 0.1-10pts.wt. component A and 0.1-10pts.wt. component B and, if necessary, 500pts.wt. or below binder, 0.001-5pts.wt. thermal polymerization inhibitor, etc., are added to the mixture to obtain a photopolymerizable composition.
申请公布号 JPS6274901(A) 申请公布日期 1987.04.06
申请号 JP19850215631 申请日期 1985.09.27
申请人 UNITIKA LTD 发明人 IWAYA YOSHIAKI;HIOKI MASANOBU;MARUYAMA MEGUMI
分类号 C08F2/50;G03F7/029;G03F7/031 主分类号 C08F2/50
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