Arrangement for controlling the deflection of an electron beam

摘要

The invention relates to an arrangement for controlling the deflection of an electron beam (5) by means of a magnetic deflection system (2, 3, 12, 15). This arrangement has a magnetic field sensor (18) at a defined point in the magnetic field which is produced by the deflection system (1, 12). The magnetic field sensor produces an actual value of the magnetic field of the deflection system (1, 12), which value is processed by a control device (15) in order to control the deflection system (2, 3, 12, 15) (Fig. 1). <IMAGE>