发明名称 INSPECTING INSTRUMENT FOR WAFER FOREIGN MATTER
摘要 PURPOSE:To perform high-precision foreign matter inspection while reducing the size and weight of an inspecting instrument and preventing an out-of-focus state from being caused by external vibration by disconnecting a driving system which drives and rotates a disk where a body to be inspected is mounted from a driving system which moves up and down the disk finely for focusing. CONSTITUTION:The rotating shaft part 70 of the rotary disk 12 which sucks the body to be inspected under negative pressure is supported in a cylinder body 78 by an air seal 80A so that it can be moved up and down finely, and the rotary disk is driven and rotated by a motor 106 through a coupling 104. The cylinder body 78 and disk 12 which are supported by a support block 84 are moved up and down finely by the motor 86, its screw shaft, and the lever effect of a lever to put the object on the disk in focus. Thus, the motor 86 for focusing and the motor 106 for disk rotation are disconnected from each other, so the motor 86 is reduced in size and weight and the position shift of the disk and an out-of-focus state are prevented from being cause by external vibration to perform high-precision foreign matter inspection.
申请公布号 JPS6271833(A) 申请公布日期 1987.04.02
申请号 JP19850212806 申请日期 1985.09.26
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 TANIUCHI TOSHIAKI
分类号 G01N21/88;G01B11/30;G01N21/94;G01N21/956;H01L21/66 主分类号 G01N21/88
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