发明名称 Transparent electroconductive material and process for preparation thereof.
摘要 <p>Described is a transparent electroconductive material composed of a transparent synthetic resin substrate and a transparent electroconductive film formed on the resin substrate. At least a surface portion of the resin substrate on which the electroconductive film is formed satisfies a requirement represented by the formula: F x Hv ? 0.4 wherein F is the mole number (µmole/cm&lt;Sup&gt;2&lt;/Sup&gt;) of a basic dye that can react with or adhere to the unit area of the surface of the synthetic resin, and Hv is the Vickers hardness as determined according to JIS Z-2244. The absolute value of the photoelasticity constant of the resin substrate below the glass transition temperature thereof is not larger than 15 Brewsters. A preferred transparent electroconductive material is prepared by coating an active energy ray-curing composition satisfying a requirement represented by the above formula on a surface of the transparent synthetic resin substrate having the above-mentioned absolute value of the photoelasticity constant; curing the composition with active energy rays; and forming a transparent electroconductive film on the coating layer by a low-temperature sputtering method at a temperature lower than 100°C.</p>
申请公布号 EP0216236(A1) 申请公布日期 1987.04.01
申请号 EP19860112403 申请日期 1986.09.08
申请人 MITSUBISHI RAYON CO. LTD. 发明人 MASUZAWA, TOKIHIKO;TAKESUE, MASATOSHI;KOBAYASHI, YUKIO;MORI, MITSUO
分类号 C08J7/18;C23C14/02;C23C14/08;G02F1/1333;(IPC1-7):H01B1/08;G02F1/133;B05D5/12 主分类号 C08J7/18
代理机构 代理人
主权项
地址