发明名称 Semiconductor photo-detector having a two-stepped impurity profile.
摘要 <p>A semiconductor photo-detector having a two-stepped impurity profile comprises a semiconductor substrate (10), a light absorption layer (14) of a first conductivity type formed on a semiconductor substrate, a multiplication layer (18) of a first conductivity type formed on the light dbsorption layer to multiply a photocurrent, a semiconductor region (22) of a second conductivity type formed on the multiplication layer and constituting an abrupt pn junction with the multiplication layer, and a guard ring area (38) of a second conductivity type formed around a periphery of the semiconductor region, whereby the carrier concentration profile of the guard ring region is sharp at its surface and flat below that surface.</p>
申请公布号 EP0216572(A2) 申请公布日期 1987.04.01
申请号 EP19860306984 申请日期 1986.09.10
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KURODA, FUMIHIKO C/O PATENT DIVISION;SADAMASA, TETSUO C/O PATENT DIVISION;SUZUKI, NOBUO C/O PATENT DIVISION;NAKAMURA, MASARU C/O PATENT DIVISION
分类号 H01L21/265;H01L31/105;H01L31/107 主分类号 H01L21/265
代理机构 代理人
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