WERKWIJZE VOOR HET VERVAARDIGEN VAN EEN POSITIEVE FOTORESISTLAAG.

摘要

A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.