| 摘要 |
A process for preparing a ceramic film wherein ultrafine particles of ceramics are produced in a vapor phase, a substrate is kept at a temperature lower than the temperature where the ultrafine particles are produced but high enough to allow the vapor phase reaction to proceed, forming a temperature gradient between the vapor phase and the substrate and thereby to deposit the ultrafine particles onto the substrate by utilizing a thermophoretic phenomenon, and the vapor phase reaction is allowed to continue on the ultrafine particles deposited on the substrate. After the formation of the film, the deposition of the ultrafine particles onto the substrate may be stopped while continuing the vapor reaction in the formed film to prepare a more dense film having reduced voids.
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