| 摘要 |
<p>PURPOSE:To obtain an exposuring mask impervious to reseparation by providing a filling film burying the damaged defective part of a metallic film pattern. CONSTITUTION:A positive photoresist 4 is applied to the entire surface of the exposure mask where a pattern 2 has the damaged defective part 3b. The spot exposure part 4a of the resist 4 is obtained in such a way as to cover the overall defective part 3b. At this time, exposure is preferably made through the use of ultraviolet or X-ray laser which can freely control an irradiation position in accordance with the size and position of the defect previously obtained in a pattern defect inspection step. The pattern of the resist 4 having a larger opening than the defect part 3b. The part of the pattern 2 is removed by dry etching, etc. When a chromium carbide film 3c deposits on the entire surface by spattering, etc., to remove the resist 4, it is simultaneously removed, and the filling film 3a buried in a part previously dry-etched in the pattern 2 remains in the entire chromium carbide 3c.</p> |
