发明名称 MECHANISM FOR REMOVING DEPOSITED LAYER FOR SHROUD
摘要 PURPOSE:To easily remove the deposited layer on the inside wall of a cylindrical shroud by providing a driving mechanism which drives a frame-shaped separating plate in the axial direction of the shroud while the vacuum tightness between said separating plate and a vacuum vessel is maintained to the inside of the shroud. CONSTITUTION:The separating plate 7 is held deep in, for example, the shroud 2 so as not to obstruct the formation of an epitaxial layer on a substrate 3 during the formation of said layer on the substrate. A driving bar 11 is moved back and forth from the atm. side to slide the plate 7 in the stage of removing the deposited layer sticking on the inside wall of the shroud 2. The layer sticking to the wall 22 of the shroud 2 is thereby scraped from the wall 22 and is dropped down. As a result, the surface of the shroud 2 is exposed and the cryogenic adsorption effect is improved, by which the vacuum degree of a growing chamber 12 is improved.
申请公布号 JPS6265733(A) 申请公布日期 1987.03.25
申请号 JP19850205963 申请日期 1985.09.17
申请人 NISSIN ELECTRIC CO LTD 发明人 OHASHI SHIGEJI
分类号 C23C14/24;B01J3/00;C23C14/00;C23C14/56 主分类号 C23C14/24
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