发明名称 ELECTROMAGNETIC PRESS STICKING TYPE MAGNETRON SPUTTERING SOURCE
摘要 PURPOSE:To increase an electromagnetic press sticking effect by paralleling the magnetic lines of force of the magnetic field impressed in an electromagnetic press sticking type magnetron sputtering source with a target surface and accelerating the release of the particles from the target surface by bombardment of gaseous ion. CONSTITUTION:An N pole part 2a of a magnet 2 for impressing a leaking magnetic field is adhered to the center of the rear surface of a target 1 in an electromagnetic press sticking type magnetron sputtering source. The S pole end 2b of the magnet 2 is disposed adequately apart to the front of the outside circumference of the target without adhering the same to the rear of the target 1. The magnetic lines 5a of force from the N pole 2a at the center are terminated at an annular S pole S while said lines are held extended roughly in parallel with the surface of the target 1. The magnetic field components 5a parallel with the surface increase consequently nearly over the entire surface of the target 1. A part of the magnetic path of the magnet 2 is electrically insulated by an insulating material and is conducted magnetically so that the magnetic pole part 2b is used commonly as an anode ring for impressing the electric field, thereby increasing the electromagnetic press sticking effect.
申请公布号 JPS60121268(A) 申请公布日期 1985.06.28
申请号 JP19830227576 申请日期 1983.12.01
申请人 KANAZAWA DAIGAKU 发明人 HATA TOMONOBU
分类号 C23C14/36;C23C14/35;H01J37/34 主分类号 C23C14/36
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