发明名称 MANUFACTURE OF MASK FOR INSPECTION
摘要 <p>PURPOSE:To array mask figures for facilitating the production of specimen for observation of any sectional shape by a method wherein, when multiple figures of element parts are arrayed on XY rectangular plane coordinates in a grating type, the origins of each figure are positioned at a specified interval deflected from the origins of adjoining figures. CONSTITUTION:The figures in the first and the second lines are arrayed in the Y axis direction regularly deflected by DELTAy. In such an arrayal, when the figures are sliced in the longitudinal direction along the X axis, the length equivalent to the through hole diameter is visible in the sliced lines between A2 and A2 or between C4d2 and C2 while the length scores of % of the same diameter is visible in the intermediate sliced line between B2 and B2 so that any sectional shape concerned may be evaluated without fail by a specimen produced only one time. When the radius of through hole is assumed as DELTAy, the least sectional length is equivalent to 85% of the through hole diameter to be evaluated satisfactorily. Through these procedures, the specimen need not be produced repeatedly cutting down the time for observation of any sectional shapes remarkably.</p>
申请公布号 JPS6265325(A) 申请公布日期 1987.03.24
申请号 JP19850203283 申请日期 1985.09.17
申请人 HITACHI LTD;HITACHI HARAMACHI SEMICONDUCTOR LTD 发明人 OKANO SADAO;TAKAHASHI SHIGERU;KIKUCHI MASAHIRO;KIKUCHI TAKEO
分类号 H01L21/66;G03F1/00;G03F1/44;G03F1/68;H01L21/027;H01L21/30 主分类号 H01L21/66
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