| 发明名称 |
RADIATION RESIST |
| 摘要 |
PURPOSE:To eliminate residue at the unradiated portions of radiations by providing a negative type resist layer formed on a polymer layer and polymerized by radiations. |
| 申请公布号 |
JPS5435722(A) |
申请公布日期 |
1979.03.16 |
| 申请号 |
JP19770101994 |
申请日期 |
1977.08.25 |
| 申请人 |
FUJITSU LTD |
发明人 |
KITAKOUJI TOSHISUKE;YONEDA YASUHIRO;KITAMURA TATEO |
| 分类号 |
H05K3/06;B41M5/00;B41M5/26;G03C1/72;G03F7/095;H01L21/027;H01L21/312 |
主分类号 |
H05K3/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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