| 摘要 |
PURPOSE:To provide a positive type resist having substantial sensitivity to ionizing radiation, high resolving power and excellent resistance to dry etching by consisting the same of the resulted product formed by mixing a bifunctional carboxylic acid and polymer which forms a salt, charge transfer complex or hydrogen bond by acting with said acid and bringing the same into reaction. CONSTITUTION:The resist consisting of the resulted product formed by mixing the bifunctional carboxylic acid which exhibits resolution by receiving the irradiation of the ionizing radiation and the polymer which forms the salt, charge complex or hydrogen bond by the action of at least part thereof with the bifunctional carboxylic acid and bringing the same into reaction in a suitable org. solvent such as dimethyl formamide is coated on a substrate. The ionizing radiation is then irradiated thereto to expose the resist into a pattern shape; thereafter, the resist is subjected to a plasma treatment in gaseous plasma, by which the resist pattern having a high aspect ratio is obtd. The bifunctional carboxylic acid expressed by HOOC-COOH or general formula HOOC-R-COOH (where R denotes an aliphat. hydrocarbon of 1-5C), for example, malonic acid or the like can be used for the bifunctional carboxylic acid. |
