发明名称 Process for fabricating electrical plasma-polymeric multi-layer capacitors
摘要 In a process for fabricating electrical plasma-polymeric multi-layer capacitors, a polyphenylene sulphide (PPS) or polyether ether ketone (PEEK) substrate has alternately deposited thereon glow-discharge polymeric dielectric layers based on perfluorinated hydrocarbons and regenerable thin aluminium layers serving as electrodes. Prior to the deposition of the layers, the substrate is treated in a CF4 plasma.
申请公布号 DE3533029(A1) 申请公布日期 1987.03.19
申请号 DE19853533029 申请日期 1985.09.16
申请人 SIEMENS AG 发明人 MICHEL,HARTMUT,DR.;WITTMANN,RUDOLF
分类号 H01G4/14;H01G4/30;(IPC1-7):H01G4/18 主分类号 H01G4/14
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