发明名称 |
Process for fabricating electrical plasma-polymeric multi-layer capacitors |
摘要 |
In a process for fabricating electrical plasma-polymeric multi-layer capacitors, a polyphenylene sulphide (PPS) or polyether ether ketone (PEEK) substrate has alternately deposited thereon glow-discharge polymeric dielectric layers based on perfluorinated hydrocarbons and regenerable thin aluminium layers serving as electrodes. Prior to the deposition of the layers, the substrate is treated in a CF4 plasma.
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申请公布号 |
DE3533029(A1) |
申请公布日期 |
1987.03.19 |
申请号 |
DE19853533029 |
申请日期 |
1985.09.16 |
申请人 |
SIEMENS AG |
发明人 |
MICHEL,HARTMUT,DR.;WITTMANN,RUDOLF |
分类号 |
H01G4/14;H01G4/30;(IPC1-7):H01G4/18 |
主分类号 |
H01G4/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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