| 摘要 |
An apparatus for removing a mask which extends beyond the outer edges of a semiconductor wafer bonded thereto. The apparatus includes a base having a vacuum chamber opening onto the upper surface of the base, a vacuum valve separating the vacuum chamber from a vacuum source, an actuating lever and a mask discharge facilitator. The discharge facilitator comprising a horizontal plate having a plurality of vertical pins around the periphery thereof. When the lever is actuated, it opens the vacuum valve and lifts the discharge facilitator forcing the vertical pins into contact with the mask. The simultaneous application of the vacuum holding force, and vertical force applied by the pins causes the separation of the mask from the upper surface of the wafer. |
