| 摘要 |
A focusing apparatus for projection optical system is provided with a projection optical system and an image-forming optical system. The projection optical system is disposed to project an image of an alignment mark formed on a photo mask or reticle onto a light-reflective substrate and also to reverse-project onto the photo mask the light image of the alignment mark projected on and reflected by the substrate. The image-forming optical system forms an overlap image from the reverse-projected reflected image and the alignment mark on the photo mask.
|
