| 摘要 |
PURPOSE:To obtain the titled composition having an improve photosensitivity and an enlarged developing allowability in a development by incorporating 2 kinds of specific compds. to the titled composition. CONSTITUTION:The titled composition comprises the compd. capable of generating an acid by irradiating an active ray, and the compd. having one or ore of silylureido groups shown by the formula wherein R1 and R2 are each a hydrogen atom, an (unsatd.) satd. alkyl or an (unsatd.) satd. aryl group, X is O or S atom, and capable of increasing the solubility of said compd. in a developer by an action of the acid to the titled composition. The coating film may be prepared on various substrates by dissolving the titled composition in a solvent. The visual contrast image is obtd. by imagewise exposing with the active ray to display an excellent photosensitive property of the image, and then, by developing an exposed image with an inorg. alkaline aqueous solution, thereby dissolving out an unexposed part of the image. And, the titled composition has a high sensitivity and a broad developing allowability, and has an excellent stability during a lapse of time, and may store for long periods. Thus, the titled composition may be used to the trial proofs of a lithography and a process color printing and the productions of an IC circuit and a photomask etc. |
