发明名称 |
BISAZIDE DERIVATIVE AND PHOTOSENSITIVE MATERIAL CONTAINING SAID DERIVATIVE |
摘要 |
NEW MATERIAL:The compound of formula I (n is 1 or 2; m is 0 or 1; R is alkyl or aryl). EXAMPLE:bis[p-[3-(p-Azidophenyl)-1-oxo-2-propenyl) phenyl] dimethylsilane. USE:Photosensitive material for photo-resist. PREPARATION:The objective compound can be produced e.g. by reacting 1mol of an aromatic carbonyl compound of formula II having silicon atom with 2-6mol of an aromatic aldehyde of formula III (p is 0 or 1) having azido group. |
申请公布号 |
JPS6257466(A) |
申请公布日期 |
1987.03.13 |
申请号 |
JP19850194768 |
申请日期 |
1985.09.05 |
申请人 |
SHINODA TSUTOMU;NISHIWAKI TORU;ANDA KINJI;HIDA MITSUHIKO |
发明人 |
SHINODA TSUTOMU;NISHIWAKI TORU;ANDA KINJI;HIDA MITSUHIKO |
分类号 |
C09B23/00;G03F7/022;G03F7/038;G03F7/075;H01L21/027;H01L21/30 |
主分类号 |
C09B23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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