发明名称 BISAZIDE DERIVATIVE AND PHOTOSENSITIVE MATERIAL CONTAINING SAID DERIVATIVE
摘要 NEW MATERIAL:The compound of formula I (n is 1 or 2; m is 0 or 1; R is alkyl or aryl). EXAMPLE:bis[p-[3-(p-Azidophenyl)-1-oxo-2-propenyl) phenyl] dimethylsilane. USE:Photosensitive material for photo-resist. PREPARATION:The objective compound can be produced e.g. by reacting 1mol of an aromatic carbonyl compound of formula II having silicon atom with 2-6mol of an aromatic aldehyde of formula III (p is 0 or 1) having azido group.
申请公布号 JPS6257466(A) 申请公布日期 1987.03.13
申请号 JP19850194768 申请日期 1985.09.05
申请人 SHINODA TSUTOMU;NISHIWAKI TORU;ANDA KINJI;HIDA MITSUHIKO 发明人 SHINODA TSUTOMU;NISHIWAKI TORU;ANDA KINJI;HIDA MITSUHIKO
分类号 C09B23/00;G03F7/022;G03F7/038;G03F7/075;H01L21/027;H01L21/30 主分类号 C09B23/00
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