发明名称 PROCESSING METHOD FOR PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To always develop a negative type and positive type photosensitive lithographic plate under a stable condition, by processing the plate with a desensitizer immediately after the plate is developed by supplying an unused alkaline developing agent, whose solvent is water, to the plate at every processing time. CONSTITUTION:The processing device of this method is composed of a developing section and desensitizer processing tank. The developing section is composed principally of carrying rollers, bottom-side guide plate 5, moving tppe rotaty brushes 9, solution supplying nozzles 7, squeezing rollers 5, solution receiving guide plate 1, developing solution (fresh solution) storing tank 12, developing solution supplying pump 10, diluting water tank 12', diluting water supplying pump 10', and sump solution tank 13, and, at the time of development, the pumps 12 and 12' are actuated and supply prescribed quantities of a developing solution and diluting water to a mixer 16. The mixer 16 mixes both together and supplies the mixtture to a photosensitive lithographic plate through the nozzle 7 under the operation of the brushes 9. A water supplying pipe 15 is connected with water supply. The desensitizer processing section is composed principally of a solution receiving guide plate 2, carrying rollers 3', squeezing rollers 5', and shower pipe 8 and supplies a desensitizing processing solution, which is circularly used through a desensitizing solution tank 14 and pump 1, through the nozzles 8.
申请公布号 JPS6258252(A) 申请公布日期 1987.03.13
申请号 JP19850174874 申请日期 1985.08.07
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 UEHARA MASABUMI;NAKAI HIDEYUKI;KIYONO MINORU;KOMENO ATSUO;YUGI KEIICHI;IWAKI AKIO
分类号 G03F7/30 主分类号 G03F7/30
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