| 摘要 |
PURPOSE:To prevent wasteful use of water, by washing a photosensitive lithographic plate with repeatedly used washing water after the plate is developed with the same repeatedly used developing solution. CONSTITUTION:A used developing solution is returned to a developing solution storing tank 14 after it is squeezed by means of a squeezing roller pair 5 and circularly used. A washing section is composed principallyof a washing tank 2, carrying roller pair 4', tandem roller pair 6', squeezing roller pair 5', and water supplying nozzles 8' and supplies circularly used washing water, which is circularly used by means of a washing water supplying pump 11, to a lithographic plate coming out from a developing section from the nozzles 8'. A post-processing section is composed principally of a post-processing tank 3, carring rollers 4'', squeezing rollers 5'', tandem rollers 6'', and post-processing solution supplying nozzles 8'' and the post-processing solution stored in a post- processing solution tank 16 is supplied to the lithographic plate passed through the washing section from the nozzles 8'' by means of a post-processing solution supplying pump 12. |
