PHOTORESIST FOR CREATING RELIEF STRUCTURES ON HIGH-TEMPERATURE RESISTANT POLYMERS,申请号DE19833369742-传众专利搜索

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发明名称	PHOTORESIST FOR CREATING RELIEF STRUCTURES ON HIGH-TEMPERATURE RESISTANT POLYMERS
摘要
申请公布号	DE3369742(D1)	申请公布日期	1987.03.12
申请号	DE19833369742	申请日期	1983.08.27
申请人	MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG	发明人	KLUG, RUDOLF, DR.;HARTNER, HARTMUT, DR.;MERREM, HANS-JOACHIM, DR.;NEISIUS, KARL HEINZ, DR.
分类号	C08F291/18;(IPC1-7):G03C1/68	主分类号	C08F291/18
代理机构		代理人
主权项
地址

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