发明名称 |
SEMI-CONDUCTOR MEMORY DEVICE HAVING AN INSULATED GATE FIELD EFFECT TRANSISTOR AS A FUNDAMENTAL ELEMENT |
摘要 |
A semiconductor memory device having two layers of polycrystal silicon and having an insulated gate field effect transistor as a fundamental element including by using a first layer of polycrystalline silicon serving as an electrode of a capacitor and a bit line and a second layer of polycrystalline silicon serving as a gate electrode of the transistor. |
申请公布号 |
EP0046629(B1) |
申请公布日期 |
1987.03.11 |
申请号 |
EP19810302758 |
申请日期 |
1981.06.18 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
SHIMOTORI, KAZUHIRO;OZAKI, HIDEYUKI MITSUBISHI DENKI KABUSHIKI KAISHA |
分类号 |
G11C11/401;G11C11/404;H01L21/8242;H01L23/522;H01L27/10;H01L27/108;(IPC1-7):H01L27/10;G11C11/24;H01L21/90 |
主分类号 |
G11C11/401 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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