发明名称 SEMI-CONDUCTOR MEMORY DEVICE HAVING AN INSULATED GATE FIELD EFFECT TRANSISTOR AS A FUNDAMENTAL ELEMENT
摘要 A semiconductor memory device having two layers of polycrystal silicon and having an insulated gate field effect transistor as a fundamental element including by using a first layer of polycrystalline silicon serving as an electrode of a capacitor and a bit line and a second layer of polycrystalline silicon serving as a gate electrode of the transistor.
申请公布号 EP0046629(B1) 申请公布日期 1987.03.11
申请号 EP19810302758 申请日期 1981.06.18
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SHIMOTORI, KAZUHIRO;OZAKI, HIDEYUKI MITSUBISHI DENKI KABUSHIKI KAISHA
分类号 G11C11/401;G11C11/404;H01L21/8242;H01L23/522;H01L27/10;H01L27/108;(IPC1-7):H01L27/10;G11C11/24;H01L21/90 主分类号 G11C11/401
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