发明名称 EVALUATION SYSTEM OF CLEANLINESS OF DUSTPROOF OUTFIT AND CLEANLINESS EVALUATION JIG OF OUTFIT
摘要 PURPOSE:To count grains deposited on a substrate peeling from dustproof outfits and to facilitate control of dustproof outfits by placing a mirror-shaped substrate in the specific distance away from cloth in downstream of a gas cleaning cloth of dustproof outfits. CONSTITUTION:A close 3 of a dustproof outfit is held between a cylinder 1 with the specific inner diameter and a corresponding annular cover 2, and the specific quantity of cleaned gasses passing through a filter runs on the cloth. A mirror- shaped silicon wafer 5 is arranged in the specific distance away from the cloth of a jig, and is caused to receive the gass 6 passing through the cloth. A laser scattering-type surface detector counts grains which peel from a dustproof outfit 3 of the wafer 5 and deposite on the wafer 5. With a simple system, cleanliness of the cloth 3 of dustproof outfits can be evaluated quickly and precisely, control of dustproof outfits can be carried out efficiently and a yield and quality of products such as semiconductors and medicines can be enhanced.
申请公布号 JPS60157684(A) 申请公布日期 1985.08.17
申请号 JP19840011939 申请日期 1984.01.27
申请人 HITACHI SEISAKUSHO KK 发明人 SAIKI ATSUSHI;SUZUKI MICHIO;TAMURA HIROSHI
分类号 G01N1/04;G01N15/00;G06M11/00 主分类号 G01N1/04
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