| 摘要 |
PURPOSE:To enable a good releasing treatment under a mild condition of a relatively low temp. for a short period, and to enable to extend a life of the developer for long periods. by incorporating a surface active agent contg. a fluorine atom and a piperazine compd. to the titled composition. CONSTITUTION:The releasing solution which is used for the releasing treatment in an etching treatment after forming a resist pattern comprises the surface active agent contg. the fluorine atom and the piperazine compd. The titled composition has a low toxicity and a high stability, as an org. solvent of the titled composition contains the piperazine compd. as the main component. The titled composition has special characteristics of an excellent treating capacity and capable of effecting the releasing treatment for a short period under the mild condition of the relative low temp. Thus, the titled composition makes easy to release the resist which is difficult to release, and for example, is baked at a high temp. or is treated with a dry etching or an ion sputtering method. The composition has the excellent solubility and permeability against the prescribed resist and is difficult to a fatique and makes possible to effect a good releasing treatment at many times. |
