发明名称 CONTROLLING METHOD FOR SURFACE TEMPERATURE OF SUBSTRATE
摘要 PURPOSE:To measure the temperature of a substrate with high accuracy and to control it by heating the substrate with infrared rays of <=5mum in wavelength and controlling the surface temperature by a thermometer which senses infrared rays of >=6mum emitted by the substrate. CONSTITUTION:The substrate 3 is heated by an infrared-ray lamp 23 of <=5mum in wavelength, e.g. halogen lamp and infrared rays of <=6mum among infrared rays radiated by the substrate 3 are sensed by the infrared-ray thermometer 25 to measure the substrate temperature. Then, the detected temperature is inputted to a controller 27 to control the electric power of a power source 28. Thus, the wavelengths for the heating and radiation are distinguished, so the surface temperature of the substrate is measured with high accuracy and a film of high quality is formed on the substrate.
申请公布号 JPS6250627(A) 申请公布日期 1987.03.05
申请号 JP19850191665 申请日期 1985.08.29
申请人 FUJITSU LTD 发明人 YAGI HARUYOSHI
分类号 H01L21/66;G01J5/00;G01J5/52 主分类号 H01L21/66
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